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Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen-Rich TiN Thin Films Synthesized via Reactive Magnetron DC-Sputtering
المؤلفون المشاركون
المصدر
العدد
المجلد 2008، العدد 2008 (31 ديسمبر/كانون الأول 2008)، ص ص. 1-9، 9ص.
الناشر
Hindawi Publishing Corporation
تاريخ النشر
2008-01-28
دولة النشر
مصر
عدد الصفحات
9
التخصصات الرئيسية
الملخص EN
Nitrogen-rich titanium nitride (TiN) thin films containing excess nitrogen up to 87.0 at.% were produced on (100) Si substrates via the reactive magnetron DC-sputtering of a commercially available 99.995 at.% pure Ti target within an argon-nitrogen (Ar-N2) atmosphere with a 20-to-1 gas ratio.
The process pressure (PP) and substrate temperature (TS) at which deposition occurred were varied systematically between 0.26 Pa–1.60 Pa and between 15.0∘C–600∘C, respectively, and their effects on the chemical composition, surface morphology, and preferred orientation were characterized by energy dispersive X-ray spectroscopy (EDS), field emission scanning electron microscopy (FE-SEM), and X-ray diffraction (XRD).
The EDS analysis confirms increasing nitrogen content with increasing PP and TS.
The SEM images reveal a uniform and crystallized surface morphology as well as a closely packed cross-sectional morphology for all crystalline films and a loosely packed cross-sectional morphology for amorphous films.
Films produced at lower PP and TS have a pyramidal surface morphology which transitions to a columnar and stratified structure as PP and TS increase.
The XRD analysis confirms the existence of only the δ-TiN phase and the absence of other nitrides, oxides, and/or sillicides in all cases.
It also indicates that at lower PP and TS, the preferred orientation relative to the substrate is along the (111) planes, and that it transitions to a random orientation along the (200), (220), and (311) planes as PP and TS increase and these results correlate with and qualify those observed by SEM.
نمط استشهاد جمعية علماء النفس الأمريكية (APA)
Penilla, E.& Wang, Junlan. 2008. Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen-Rich TiN Thin Films Synthesized via Reactive Magnetron DC-Sputtering. Journal of Nanomaterials،Vol. 2008, no. 2008, pp.1-9.
https://search.emarefa.net/detail/BIM-988090
نمط استشهاد الجمعية الأمريكية للغات الحديثة (MLA)
Penilla, E.& Wang, Junlan. Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen-Rich TiN Thin Films Synthesized via Reactive Magnetron DC-Sputtering. Journal of Nanomaterials No. 2008 (2008), pp.1-9.
https://search.emarefa.net/detail/BIM-988090
نمط استشهاد الجمعية الطبية الأمريكية (AMA)
Penilla, E.& Wang, Junlan. Pressure and Temperature Effects on Stoichiometry and Microstructure of Nitrogen-Rich TiN Thin Films Synthesized via Reactive Magnetron DC-Sputtering. Journal of Nanomaterials. 2008. Vol. 2008, no. 2008, pp.1-9.
https://search.emarefa.net/detail/BIM-988090
نوع البيانات
مقالات
لغة النص
الإنجليزية
الملاحظات
Includes bibliographical references
رقم السجل
BIM-988090
قاعدة معامل التأثير والاستشهادات المرجعية العربي "ارسيف Arcif"
أضخم قاعدة بيانات عربية للاستشهادات المرجعية للمجلات العلمية المحكمة الصادرة في العالم العربي
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