Morphology engineering and etching of graphene domain by low-pressure chemical vapor deposition
By: Wang, Chen; Xie, Ning; Wu, Fan…[et al.]. Journal of Saudi Chemical Society. Vol. 23, no. 2 (Feb. 2019), pp.162-170, 9 p.
Subjects: Chemical vapor deposition; Fluid mechanics; Graphene; Morphology (Linguistics); Pressure