Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n α -Si:H Thin Film Solar Cells
Joint Authors
Wang, Fang-Hsing
Hung, Shang-Chao
Lee, Yen-Hsien
Yang, Cheng-Fu
Source
International Journal of Photoenergy
Issue
Vol. 2014, Issue 2014 (31 Dec. 2014), pp.1-7, 7 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2014-05-04
Country of Publication
Egypt
No. of Pages
7
Main Subjects
Abstract EN
1.5 wt% zinc fluoride (ZnF2) was mixed with zinc oxide powder to form the F-doped ZnO (FZO) composition.
At first, the FZO thin films were deposited at room temperature and 5 × 10 - 3 Torr in pure Ar under different deposition power.
Hall measurements of the as-deposited FZO thin films were investigated, and then the electrical properties were used to find the deposition power causing the FZO thin films with minimum resistance.
The FZO thin films with minimum resistance were further treated by H2 plasma and then found their variations in the electrical properties by Hall measurements.
Hydrochloric (HCl) acid solutions with different concentrations (0.1%, 0.2%, and 0.5%) were used to etch the surfaces of the FZO thin films.
Finally, the as-deposited, HCl-etched as-deposited, and HCl-etched H2-plasma-treated FZO thin films were used as transparent electrodes to fabricate the p-i-n α-Si:H thin film solar cells and their characteristics were compared in this study.
We would show that using H2-plasma-treated and HCl-etched FZO thin films as transparent electrodes would improve the efficiency of the fabricated thin film solar cells.
American Psychological Association (APA)
Wang, Fang-Hsing& Hung, Shang-Chao& Yang, Cheng-Fu& Lee, Yen-Hsien. 2014. Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n α -Si:H Thin Film Solar Cells. International Journal of Photoenergy،Vol. 2014, no. 2014, pp.1-7.
https://search.emarefa.net/detail/BIM-1036922
Modern Language Association (MLA)
Wang, Fang-Hsing…[et al.]. Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n α -Si:H Thin Film Solar Cells. International Journal of Photoenergy No. 2014 (2014), pp.1-7.
https://search.emarefa.net/detail/BIM-1036922
American Medical Association (AMA)
Wang, Fang-Hsing& Hung, Shang-Chao& Yang, Cheng-Fu& Lee, Yen-Hsien. Effects of Hydrogen Plasma on the Electrical Properties of F-Doped ZnO Thin Films and p-i-n α -Si:H Thin Film Solar Cells. International Journal of Photoenergy. 2014. Vol. 2014, no. 2014, pp.1-7.
https://search.emarefa.net/detail/BIM-1036922
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1036922