Study on the Microstructure and Electrical Properties of Boron and Sulfur Codoped Diamond Films Deposited Using Chemical Vapor Deposition
Joint Authors
Jing, Zhang
Rongbin, Li
Xianghu, Wang
Xicheng, Wei
Source
Issue
Vol. 2014, Issue 2014 (31 Dec. 2014), pp.1-7, 7 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2014-05-21
Country of Publication
Egypt
No. of Pages
7
Main Subjects
Abstract EN
The atomic-scale microstructure and electron emission properties of boron and sulfur (denoted as B-S) codoped diamond films grown on high-temperature and high-pressure (HTHP) diamond and Si substrates were investigated using atom force microscopy (AFM), scanning tunneling microscopy (STM), secondary ion mass spectroscopy (SIMS), and current imaging tunneling spectroscopy (CITS) measurement techniques.
The films grown on Si consisted of large grains with secondary nucleation, whereas those on HTHP diamond are composed of well-developed polycrystalline facets with an average size of 10–50 nm.
SIMS analyses confirmed that sulfur was successfully introduced into diamond films, and a small amount of boron facilitated sulfur incorporation into diamond.
Large tunneling currents were observed at some grain boundaries, and the emission character was better at the grain boundaries than that at the center of the crystal.
The films grown on HTHP diamond substrates were much more perfect with higher quality than the films deposited on Si substrates.
The local I-V characteristics for films deposited on Si or HTHP diamond substrates indicate n-type conduction.
American Psychological Association (APA)
Jing, Zhang& Rongbin, Li& Xianghu, Wang& Xicheng, Wei. 2014. Study on the Microstructure and Electrical Properties of Boron and Sulfur Codoped Diamond Films Deposited Using Chemical Vapor Deposition. Journal of Nanomaterials،Vol. 2014, no. 2014, pp.1-7.
https://search.emarefa.net/detail/BIM-1041208
Modern Language Association (MLA)
Jing, Zhang…[et al.]. Study on the Microstructure and Electrical Properties of Boron and Sulfur Codoped Diamond Films Deposited Using Chemical Vapor Deposition. Journal of Nanomaterials No. 2014 (2014), pp.1-7.
https://search.emarefa.net/detail/BIM-1041208
American Medical Association (AMA)
Jing, Zhang& Rongbin, Li& Xianghu, Wang& Xicheng, Wei. Study on the Microstructure and Electrical Properties of Boron and Sulfur Codoped Diamond Films Deposited Using Chemical Vapor Deposition. Journal of Nanomaterials. 2014. Vol. 2014, no. 2014, pp.1-7.
https://search.emarefa.net/detail/BIM-1041208
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1041208