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The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering
Joint Authors
Hieu, Le Van
Dang, Huu Phuc
Luc, Quang Ho
Le, Tran
Source
Issue
Vol. 2016, Issue 2016 (31 Dec. 2016), pp.1-11, 11 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2016-05-23
Country of Publication
Egypt
No. of Pages
11
Main Subjects
Abstract EN
Transparent Sb-doped tin oxide (ATO) thin films were fabricated on quartz glass substrates via a mixed (SnO2 + Sb2O3) ceramic target using direct current (DC) magnetron sputtering in ambient Ar gas at a working pressure of 2 × 10−3 torr.
X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Hall-effect, and UV-vis spectra measurements were performed to characterize the deposited films.
The substrate temperature of the films was investigated in two ways: (1) films were annealed in Ar ambient gas after being deposited at room temperature or (2) they were deposited directly at different temperatures.
The first process for fabricating the ATO films was found to be easier than the second process.
The deposited films showed p-type electrical properties, a polycrystalline tetragonal rutile structure, and their average transmittance was greater than 80% in the visible light range at the optimum annealing temperature of 500°C.
The best electrical properties of the film were obtained on a 10 wt% Sb2O3-doped SnO2 target with a resistivity, hole concentration, and Hall mobility of 0.55 Ω·cm, 1.2 × 1019 cm−3, and 0.54 cm2V−1s−1, respectively.
American Psychological Association (APA)
Dang, Huu Phuc& Luc, Quang Ho& Le, Tran& Hieu, Le Van. 2016. The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering. Journal of Nanomaterials،Vol. 2016, no. 2016, pp.1-11.
https://search.emarefa.net/detail/BIM-1109383
Modern Language Association (MLA)
Dang, Huu Phuc…[et al.]. The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering. Journal of Nanomaterials No. 2016 (2016), pp.1-11.
https://search.emarefa.net/detail/BIM-1109383
American Medical Association (AMA)
Dang, Huu Phuc& Luc, Quang Ho& Le, Tran& Hieu, Le Van. The Optimum Fabrication Condition of p-Type Antimony Tin Oxide Thin Films Prepared by DC Magnetron Sputtering. Journal of Nanomaterials. 2016. Vol. 2016, no. 2016, pp.1-11.
https://search.emarefa.net/detail/BIM-1109383
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1109383