Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer
Joint Authors
Liu, Gang Logan
Jiang, Jing
Xu, Zhida
Lin, Jiahao
Source
Issue
Vol. 2016, Issue 2016 (31 Dec. 2016), pp.1-6, 6 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2016-04-18
Country of Publication
Egypt
No. of Pages
6
Main Subjects
Abstract EN
A three-step process has been demonstrated to improve the performance of photodiode by creating nanocone forest on the surface of photodiode as an antireflection layer.
This high-throughput, low-cost process has been shown to decrease the reflectivity by 66.1%, enhance the quantum efficiency by 27%, and increase the responsivity by 25.7%.
This low-cost manufacture process can be applied to increase the responsivity of silicon based photonic devices.
American Psychological Association (APA)
Jiang, Jing& Xu, Zhida& Lin, Jiahao& Liu, Gang Logan. 2016. Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer. Journal of Sensors،Vol. 2016, no. 2016, pp.1-6.
https://search.emarefa.net/detail/BIM-1110448
Modern Language Association (MLA)
Jiang, Jing…[et al.]. Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer. Journal of Sensors No. 2016 (2016), pp.1-6.
https://search.emarefa.net/detail/BIM-1110448
American Medical Association (AMA)
Jiang, Jing& Xu, Zhida& Lin, Jiahao& Liu, Gang Logan. Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer. Journal of Sensors. 2016. Vol. 2016, no. 2016, pp.1-6.
https://search.emarefa.net/detail/BIM-1110448
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1110448
