Graphene Membrane as Suspended Mask for Lithography
Joint Authors
Amato, Giampiero
Greco, Angelo
Vittone, Ettore
Source
Issue
Vol. 2018, Issue 2018 (31 Dec. 2018), pp.1-8, 8 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2018-10-15
Country of Publication
Egypt
No. of Pages
8
Main Subjects
Abstract EN
Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes.
The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate.
This technique, which is largely used for realizing mesoscopic devices, where the quality requirements for the junctions prevent the exposure to ambient air and the occurrence of quantum phenomena requires highly defined structures, can be improved by the use of pure 2-dimensional masks, like graphene ones.
Advantages and differences of this material with respect to commonly employed polymers are presented and discussed.
American Psychological Association (APA)
Amato, Giampiero& Greco, Angelo& Vittone, Ettore. 2018. Graphene Membrane as Suspended Mask for Lithography. Journal of Nanomaterials،Vol. 2018, no. 2018, pp.1-8.
https://search.emarefa.net/detail/BIM-1193877
Modern Language Association (MLA)
Amato, Giampiero…[et al.]. Graphene Membrane as Suspended Mask for Lithography. Journal of Nanomaterials No. 2018 (2018), pp.1-8.
https://search.emarefa.net/detail/BIM-1193877
American Medical Association (AMA)
Amato, Giampiero& Greco, Angelo& Vittone, Ettore. Graphene Membrane as Suspended Mask for Lithography. Journal of Nanomaterials. 2018. Vol. 2018, no. 2018, pp.1-8.
https://search.emarefa.net/detail/BIM-1193877
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-1193877