A simulation of radio frequency plasmas sustained in electropositive gas

Abstract FRE

and //( ا/اءا/،ء ،ا'ا<ا/؛/ '، ،ا'ا'،/، Plasma enhanced etching and déposition is crucial III iiucroele< Ironic used to '،٢،؛ (materials processing III general.

Ill this process, low pressure ،'/،'،•//•،،• gas discharges (plasmas react to etch the substrate or to deposit a solid film.

To attain أ/ ،اا/ اا dissociate a feedstock gas into radicals understanding of the glow discharge is required.

'ااء/ا؛///ااا،»/ء better results in these application fields, a Computational modeling is a key tool for studying collisions/ plasma discharges, '!he Slonte ( 'arlo simulation fsrcxc/n .\()/nc (icmUcd Jft'opcf'ifcs o