The effect of chemical polishing on polysilicon surface
Source
Mu'tah Journal for Research and Studies : Natural and Applied Sciences Series
Issue
Vol. 9, Issue 2 (31 Jul. 1994), pp.57-69, 13 p.
Publisher
Mutah University Deanship of Academic Research
Publication Date
1994-07-31
Country of Publication
Jordan
No. of Pages
13
Main Subjects
Abstract EN
Chemical polishing of polysilicon (Poly Si) has been investigated using scanning electron microscopy (SEM), reflectance spectrophotometry and dark electrical I-V measurements.
It was observed that chemical polishing affects surface roughness and shows deeper etching at grain boundaries.
It was also found that etching by solution A for 15 minutes produces a low reflectivity surface and better quality Al-poly Si (P-type) Schottky diodes.
American Psychological Association (APA)
Hasan, Y. M.& Dhannun, H. H.& Husayn, M. M. S.& Abbud, S. R.. 1994. The effect of chemical polishing on polysilicon surface. Mu'tah Journal for Research and Studies : Natural and Applied Sciences Series،Vol. 9, no. 2, pp.57-69.
https://search.emarefa.net/detail/BIM-397112
Modern Language Association (MLA)
Hasan, Y. M.…[et al.]. The effect of chemical polishing on polysilicon surface. Mu'tah Journal for Research and Studies : Natural and Applied Sciences Series Vol. 9, no. 2 (Jul. 1994), pp.57-69.
https://search.emarefa.net/detail/BIM-397112
American Medical Association (AMA)
Hasan, Y. M.& Dhannun, H. H.& Husayn, M. M. S.& Abbud, S. R.. The effect of chemical polishing on polysilicon surface. Mu'tah Journal for Research and Studies : Natural and Applied Sciences Series. 1994. Vol. 9, no. 2, pp.57-69.
https://search.emarefa.net/detail/BIM-397112
Data Type
Journal Articles
Language
English
Notes
Includes appendices : p. 63-68
Record ID
BIM-397112
