Inductively Coupled Plasma Sources and Applications
Author
Source
Physics Research International
Issue
Vol. 2010, Issue 2010 (31 Dec. 2010), pp.1-14, 14 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2011-02-20
Country of Publication
Egypt
No. of Pages
14
Main Subjects
Abstract EN
The principle of inductively coupled plasma (ICP) and perspective of ICP development are reviewed.
Multispiral coil ICP (MSC-ICP), which has the advantages of low inductance, high efficiency, and excellent uniformity, is discussed in detail.
Applications to thin film processing technologies and the future prospects of ICP are also described.
American Psychological Association (APA)
Okumura, Tomohiro. 2011. Inductively Coupled Plasma Sources and Applications. Physics Research International،Vol. 2010, no. 2010, pp.1-14.
https://search.emarefa.net/detail/BIM-450998
Modern Language Association (MLA)
Okumura, Tomohiro. Inductively Coupled Plasma Sources and Applications. Physics Research International No. 2010 (2010), pp.1-14.
https://search.emarefa.net/detail/BIM-450998
American Medical Association (AMA)
Okumura, Tomohiro. Inductively Coupled Plasma Sources and Applications. Physics Research International. 2011. Vol. 2010, no. 2010, pp.1-14.
https://search.emarefa.net/detail/BIM-450998
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-450998
