Crystal Growth Behaviors of Silicon during Melt Growth Processes

Author

Fujiwara, Kozo

Source

International Journal of Photoenergy

Issue

Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-16, 16 p.

Publisher

Hindawi Publishing Corporation

Publication Date

2012-03-19

Country of Publication

Egypt

No. of Pages

16

Main Subjects

Chemistry

Abstract EN

It is imperative to improve the crystal quality of Si multicrystal ingots grown by casting because they are widely used for solar cells in the present and will probably expand their use in the future.

Fine control of macro- and microstructures, grain size, grain orientation, grain boundaries, dislocation/subgrain boundaries, and impurities, in a Si multicrystal ingot, is therefore necessary.

Understanding crystal growth mechanisms in melt growth processes is thus crucial for developing a good technology for producing high-quality Si multicrystal ingots for solar cells.

In this review, crystal growth mechanisms involving the morphological transformation of the crystal-melt interface, grain boundary formation, parallel-twin formation, and faceted dendrite growth are discussed on the basis of the experimental results of in situ observations.

American Psychological Association (APA)

Fujiwara, Kozo. 2012. Crystal Growth Behaviors of Silicon during Melt Growth Processes. International Journal of Photoenergy،Vol. 2012, no. 2012, pp.1-16.
https://search.emarefa.net/detail/BIM-451449

Modern Language Association (MLA)

Fujiwara, Kozo. Crystal Growth Behaviors of Silicon during Melt Growth Processes. International Journal of Photoenergy No. 2012 (2012), pp.1-16.
https://search.emarefa.net/detail/BIM-451449

American Medical Association (AMA)

Fujiwara, Kozo. Crystal Growth Behaviors of Silicon during Melt Growth Processes. International Journal of Photoenergy. 2012. Vol. 2012, no. 2012, pp.1-16.
https://search.emarefa.net/detail/BIM-451449

Data Type

Journal Articles

Language

English

Notes

Includes bibliographical references

Record ID

BIM-451449