Polishing Sapphire Substrates by 355 nm Ultraviolet Laser
Joint Authors
Wei, X.
Huang, J. F.
Hu, W.
Xie, X. Z.
Source
International Journal of Optics
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-7, 7 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2012-07-10
Country of Publication
Egypt
No. of Pages
7
Main Subjects
Abstract EN
This paper tries to investigate a novel polishing technology with high efficiency and nice surface quality for sapphire crystal that has high hardness, wear resistance, and chemical stability.
A Q-switched 355 nm ultraviolet laser with nanosecond pulses was set up and used to polish sapphire substrate in different conditions in this paper.
Surface roughness Ra of polished sapphire was measured with surface profiler, and the surface topography was observed with scanning electronic microscope.
The effects of processing parameters as laser energy, pulse repetition rate, scanning speed, incident angle, scanning patterns, and initial surface conditions on surface roughness were analyzed.
American Psychological Association (APA)
Wei, X.& Xie, X. Z.& Hu, W.& Huang, J. F.. 2012. Polishing Sapphire Substrates by 355 nm Ultraviolet Laser. International Journal of Optics،Vol. 2012, no. 2012, pp.1-7.
https://search.emarefa.net/detail/BIM-456329
Modern Language Association (MLA)
Wei, X.…[et al.]. Polishing Sapphire Substrates by 355 nm Ultraviolet Laser. International Journal of Optics No. 2012 (2012), pp.1-7.
https://search.emarefa.net/detail/BIM-456329
American Medical Association (AMA)
Wei, X.& Xie, X. Z.& Hu, W.& Huang, J. F.. Polishing Sapphire Substrates by 355 nm Ultraviolet Laser. International Journal of Optics. 2012. Vol. 2012, no. 2012, pp.1-7.
https://search.emarefa.net/detail/BIM-456329
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-456329