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17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching
Joint Authors
Shim, Ji-Myung
Oh, Dong-Joon
Lee, Hae-Seok
Kim, Ji-Soo
Cho, Kyeong-Yeon
Seo, Jae-Keun
Choi, Jun-Young
Lee, Soo-Hong
Kong, Ji-Hyun
Lee, Hyun-Woo
Kim, Ji-Sun
Lee, Eun-Joo
Shin, Jeong-Eun
Source
International Journal of Photoenergy
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-6, 6 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2012-03-06
Country of Publication
Egypt
No. of Pages
6
Main Subjects
Abstract EN
For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer.
RIE texturing had a deep and narrow textured surface and showed excellent low reflectance.
Due to plasma-induced damage, unless the RIE-textured surfaces have the proper damage removal etching (DRE), they have a drop in V oc and FF.
RIE texturing with a proper DRE had sufficiently higher short circuit current (Isc) than acidic-textured samples without a drop in open circuit voltage (V oc ).
And in order to improve efficiency of mc-Si solar cell, we applied RIE texturing with optimized DRE condition to selective emitter structure.
In comparison with the acidic-textured solar cells, RIE-textured solar cells have above 200 mA absolute gain in Isc.
And optimized RIE samples with a DRE by HNO3/HF mixture showed 17.6% conversion efficiency, which were made using an industrial screen printing process with selective emitter structure.
American Psychological Association (APA)
Shim, Ji-Myung& Lee, Hyun-Woo& Cho, Kyeong-Yeon& Seo, Jae-Keun& Kim, Ji-Soo& Lee, Eun-Joo…[et al.]. 2012. 17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching. International Journal of Photoenergy،Vol. 2012, no. 2012, pp.1-6.
https://search.emarefa.net/detail/BIM-457169
Modern Language Association (MLA)
Shim, Ji-Myung…[et al.]. 17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching. International Journal of Photoenergy No. 2012 (2012), pp.1-6.
https://search.emarefa.net/detail/BIM-457169
American Medical Association (AMA)
Shim, Ji-Myung& Lee, Hyun-Woo& Cho, Kyeong-Yeon& Seo, Jae-Keun& Kim, Ji-Soo& Lee, Eun-Joo…[et al.]. 17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching. International Journal of Photoenergy. 2012. Vol. 2012, no. 2012, pp.1-6.
https://search.emarefa.net/detail/BIM-457169
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-457169