Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography
Joint Authors
Mizoguchi, Hakaru
Hori, Tsukasa
Yanagida, Tatsuya
Fujimoto, Junichi
Source
Physics Research International
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-11, 11 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2012-09-05
Country of Publication
Egypt
No. of Pages
11
Main Subjects
Abstract EN
Since 2002, we have been developing a carbon dioxide (CO2) laser-produced tin (Sn) plasma (LPP) extreme ultraviolet (EUV) light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W) light source for high volume manufacturing.
EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma.
We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use.
We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO2 laser energy absorption rate.
The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE).
We focus on prepulsed laser pulsed duration.
When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE (CO2 laser to EUV; our previous data was 3.8%) at 2 mJ EUV pulse energy.
Based on these data we are developing our first light source as our product: “GL200E.” The latest data and the overview of EUV light source for the industrial EUV lithography are reviewed in this paper.
American Psychological Association (APA)
Fujimoto, Junichi& Hori, Tsukasa& Yanagida, Tatsuya& Mizoguchi, Hakaru. 2012. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography. Physics Research International،Vol. 2012, no. 2012, pp.1-11.
https://search.emarefa.net/detail/BIM-457301
Modern Language Association (MLA)
Yanagida, Tatsuya…[et al.]. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography. Physics Research International No. 2012 (2012), pp.1-11.
https://search.emarefa.net/detail/BIM-457301
American Medical Association (AMA)
Fujimoto, Junichi& Hori, Tsukasa& Yanagida, Tatsuya& Mizoguchi, Hakaru. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography. Physics Research International. 2012. Vol. 2012, no. 2012, pp.1-11.
https://search.emarefa.net/detail/BIM-457301
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-457301