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Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs
Joint Authors
Source
International Journal of Electrochemistry
Issue
Vol. 2011, Issue 2011 (31 Dec. 2011), pp.1-8, 8 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2010-12-16
Country of Publication
Egypt
No. of Pages
8
Main Subjects
Abstract EN
Submicron thin yttria stabilized zirconia (YSZ) films were prepared on a variety of substrates with different surface morphologies by magnetron sputtering followed by thermal oxidation.
Pinholes were observed in the films deposited on nanoporous alumina substrates.
Initial dense Y/Zr films developed nanocracks after thermal oxidation on smooth Si wafer substrates.
At optimal sputtering and oxidation conditions, smooth and crack/pore-free films were achieved on Si wafer substrates.
The thin YSZ films exhibited fully ionic conduction with ionic conductivities, and activation energy corroborated well with the values from commercial YSZ plates.
The thin YSZ films can be utilized in Solid Oxide Fuel Cells (SOFCs) for intermediate temperature operations.
American Psychological Association (APA)
Hill, T.& Huang, H.. 2010. Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs. International Journal of Electrochemistry،Vol. 2011, no. 2011, pp.1-8.
https://search.emarefa.net/detail/BIM-474789
Modern Language Association (MLA)
Hill, T.& Huang, H.. Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs. International Journal of Electrochemistry No. 2011 (2011), pp.1-8.
https://search.emarefa.net/detail/BIM-474789
American Medical Association (AMA)
Hill, T.& Huang, H.. Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs. International Journal of Electrochemistry. 2010. Vol. 2011, no. 2011, pp.1-8.
https://search.emarefa.net/detail/BIM-474789
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-474789