Adaptive Step-Size Control in Simulation of Diffusive CVD Processes

Abstract EN

We present control strategies of a diffusion process for chemical vapor deposition for metallic bipolar plates.

In the models, we discuss the application of different models to simulate the plasma-transport of chemical reactants in the gas-chamber.

The contribution are an optimal control problem based on a PID control to obtain a homogeneous layering.

We have taken into account one- and two-dimensional problems that are given with constraints and control functions.

A finite-element formulation with adaptive feedback control for time-step selection has been developed for the diffusion process.

The optimization is presented with efficient algorithms.

Numerical experiments are discussed with respect to the diffusion processes of the macroscopic model.