RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers
Joint Authors
Zeng, Libin
Hong, Ruijiang
Tao, Luping
Chen, Siming
Source
International Journal of Photoenergy
Issue
Vol. 2013, Issue 2013 (31 Dec. 2013), pp.1-5, 5 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2013-02-02
Country of Publication
Egypt
No. of Pages
5
Main Subjects
Abstract EN
Aluminum oxide films were deposited on crystalline silicon substrates by reactive RF magnetron sputtering.
The influences of the deposition parameters on the surface passivation, surface damage, optical properties, and composition of the films have been investigated.
It is found that proper sputtering power and uniform magnetic field reduced the surface damage from the high-energy ion bombardment to the silicon wafers during the process and consequently decreased the interface trap density, resulting in the good surface passivation; relatively high refractive index of aluminum oxide film is benefic to improve the surface passivation.
The negative-charged aluminum oxide film was then successfully prepared.
The surface passivation performance was further improved after postannealing by formation of an SiOx interfacial layer.
It is demonstrated that the reactive sputtering is an effective technique of fabricating aluminum oxide surface passivation film for low-cost high-efficiency crystalline silicon solar cells.
American Psychological Association (APA)
Chen, Siming& Tao, Luping& Zeng, Libin& Hong, Ruijiang. 2013. RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers. International Journal of Photoenergy،Vol. 2013, no. 2013, pp.1-5.
https://search.emarefa.net/detail/BIM-498481
Modern Language Association (MLA)
Chen, Siming…[et al.]. RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers. International Journal of Photoenergy No. 2013 (2013), pp.1-5.
https://search.emarefa.net/detail/BIM-498481
American Medical Association (AMA)
Chen, Siming& Tao, Luping& Zeng, Libin& Hong, Ruijiang. RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers. International Journal of Photoenergy. 2013. Vol. 2013, no. 2013, pp.1-5.
https://search.emarefa.net/detail/BIM-498481
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-498481