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Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation
Joint Authors
Sato, Mitsunobu
Nakamura, Isao
Shukur, Haider A.
Takano, Ichiro
Source
Advances in Materials Science and Engineering
Issue
Vol. 2012, Issue 2012 (31 Dec. 2012), pp.1-7, 7 p.
Publisher
Hindawi Publishing Corporation
Publication Date
2011-12-19
Country of Publication
Egypt
No. of Pages
7
Main Subjects
Engineering Sciences and Information Technology
Abstract EN
TiO2 thin films of a rutile, an anatase, and a mixture type with anatase and rutile were fabricated by a magnetron sputtering method.
The fabricated films were irradiated by N+ ions with several doses using the Freeman ion source.
Atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and UV-VIS spectrophotometer were employed to investigate morphology, structure, chemical state, and optical characteristics, respectively.
Photocatalytic activity was evaluated by degradation of a methylene blue solution using UV and visible light.
TiO2 thin films with each structure irradiated by N+ ions showed the different N concentration in the same N+ ion dose and the chemical state of XPS results suggested that an O atom in TiO2 lattice replaced by an N atom.
Therefore the photocatalytic activity of TiO2 thin films was improved under visible light.
The maximum photocatalytic activity of TiO2 thin films with each structure was indicated at N concentration of 2.1% for a rutile type, of 1.0% for an anatase type, and of 3.8% for a mixture type under the condition of 2.5×1015 ions/cm2 in N+ ion dose.
American Psychological Association (APA)
Shukur, Haider A.& Sato, Mitsunobu& Nakamura, Isao& Takano, Ichiro. 2011. Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation. Advances in Materials Science and Engineering،Vol. 2012, no. 2012, pp.1-7.
https://search.emarefa.net/detail/BIM-508433
Modern Language Association (MLA)
Shukur, Haider A.…[et al.]. Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation. Advances in Materials Science and Engineering No. 2012 (2012), pp.1-7.
https://search.emarefa.net/detail/BIM-508433
American Medical Association (AMA)
Shukur, Haider A.& Sato, Mitsunobu& Nakamura, Isao& Takano, Ichiro. Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation. Advances in Materials Science and Engineering. 2011. Vol. 2012, no. 2012, pp.1-7.
https://search.emarefa.net/detail/BIM-508433
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references
Record ID
BIM-508433