Nanostructure NiO films prepared by PLD and their optoelectronic properties
Other Title(s)
أغشية أوكسيد النيكل النانوية المحضرة بطريقة الترسيب بالليزر النبضي و خصائصها الكهرو بصرية
Joint Authors
Jbair, Dua S.
Simon, Jihan A.
Khashshan, Khawlah S.
Source
Engineering and Technology Journal
Issue
Vol. 33, Issue 5B (31 May. 2015), pp.951-959, 9 p.
Publisher
Publication Date
2015-05-31
Country of Publication
Iraq
No. of Pages
9
Main Subjects
Topics
Abstract EN
NiO thin films have compounded by pulsed laser deposition on glass and silicon (111) substrates, employing Q-switching Nd:YAG laser.
Structure, grain size and optical properties have analyzed by using FTIR, AFM and UV-VIS spectroscopy.
FTIR spectra conformed of NiO bonding.
AFM images show the particle size about ~66nm.
The optical transmission results premiered the transparency of the NiO films is greater than 70% in the visible region with optical band gap 3.85eV.
The current voltage characterization of NiO/Si heterojunction has good rectifying.
Keywords : NiO thin film, photodetector, Characterization of NiO
American Psychological Association (APA)
Jbair, Dua S.& Simon, Jihan A.& Khashshan, Khawlah S.. 2015. Nanostructure NiO films prepared by PLD and their optoelectronic properties. Engineering and Technology Journal،Vol. 33, no. 5B, pp.951-959.
https://search.emarefa.net/detail/BIM-655643
Modern Language Association (MLA)
Jbair, Dua S.…[et al.]. Nanostructure NiO films prepared by PLD and their optoelectronic properties. Engineering and Technology Journal Vol. 33, no. 5B (May. 2015), pp.951-959.
https://search.emarefa.net/detail/BIM-655643
American Medical Association (AMA)
Jbair, Dua S.& Simon, Jihan A.& Khashshan, Khawlah S.. Nanostructure NiO films prepared by PLD and their optoelectronic properties. Engineering and Technology Journal. 2015. Vol. 33, no. 5B, pp.951-959.
https://search.emarefa.net/detail/BIM-655643
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references : p. 957-959
Record ID
BIM-655643
