Spectroscopic study for plasma parameters in co-sputtering system

Abstract EN

In this work the parameters of plasma (electron temperature Te, electron density ne, electron velocity and ion velocity) have been studied by using the spectrometer that collect the spectrum of plasma.

Two cathodes were used (Si:Si) P-type and deposited on glass.

In this research argon gas has been used at various values of pressures (0.5, 0.4, 0.3, and 0.2 torr) with constant deposition time 4 hrs.

The results of electron temperature were (31596.19, 31099.77, 26020.14 and 25372.64) kelvin, and electron density (7.60*1016, 8.16*1016, 6.82*1016 and 7.11*1016) m-3.

Optical properties of Si were determined through the optical transmission method using ultraviolet visible spectrophotometer with in the range (300 – 1100) nm.