Morphology engineering and etching of graphene domain by low-pressure chemical vapor deposition
Joint Authors
Wang, Chen
Xie, Ning
Jiang, Bang Bang
Pan, Ming
Li, Hua Fei
Hu, Hai Yan
Yan, Xiao Ling
Wu, Marvin H.
Vinodgopal, K.
Dai, Gui Ping
Wu, Fan
Source
Journal of Saudi Chemical Society
Issue
Vol. 23, Issue 2 (28 Feb. 2019), pp.162-170, 9 p.
Publisher
Publication Date
2019-02-28
Country of Publication
Saudi Arabia
No. of Pages
9
Main Subjects
Topics
Abstract EN
Controlled growth of single-crystal high-quality ‘track-and-field ground’ shaped graphene domains and the morphological evolution from hexagonal to hexagram graphene domain even square and circular graphene domain has been achieved by low-pressure CVD on solid copper substrate, thereby demonstrating that the shape of the graphene grains can potentially be precisely tuned by optimizing growth parameters.
The etching reaction of graphene has also been studied, and results show that a low flow rate of hydrogen (99.999%) is favorable to form hexagonal structure for the etching reaction of graphene due to the exist of oxygen or oxidizing impurities in hydrogen gas commonly used.
Controlled growth and etching reaction of graphene determine the final shape of graphene domains and all these efforts contribute to the study of size and morphology and the growth mechanism of graphene domains.
American Psychological Association (APA)
Jiang, Bang Bang& Pan, Ming& Wang, Chen& Li, Hua Fei& Xie, Ning& Hu, Hai Yan…[et al.]. 2019. Morphology engineering and etching of graphene domain by low-pressure chemical vapor deposition. Journal of Saudi Chemical Society،Vol. 23, no. 2, pp.162-170.
https://search.emarefa.net/detail/BIM-892779
Modern Language Association (MLA)
Jiang, Bang Bang…[et al.]. Morphology engineering and etching of graphene domain by low-pressure chemical vapor deposition. Journal of Saudi Chemical Society Vol. 23, no. 2 (Feb. 2019), pp.162-170.
https://search.emarefa.net/detail/BIM-892779
American Medical Association (AMA)
Jiang, Bang Bang& Pan, Ming& Wang, Chen& Li, Hua Fei& Xie, Ning& Hu, Hai Yan…[et al.]. Morphology engineering and etching of graphene domain by low-pressure chemical vapor deposition. Journal of Saudi Chemical Society. 2019. Vol. 23, no. 2, pp.162-170.
https://search.emarefa.net/detail/BIM-892779
Data Type
Journal Articles
Language
English
Notes
Includes bibliographical references : p. 169-170
Record ID
BIM-892779