Optical characterizations of rf-magnetron sputtered nanocrystalline tio2 thin film

Abstract EN

TiO2 nanocrystalline thin films are widely used as antireflection coating in solar cell, in this paper, RF magnetron sputtering technique is used to prepare TiO2 thin film on glass substrates, TiO2 thin films deposited under different powers (75,100,125 and 150) Watt for (1.5) hour resulted in different layer thickness (62.5,88,118 and 132.6) nm respectively.

The optical properties examined by UV-VIS spectroscopy.

TiO2 thin films exhibit a high transparency in the region from about 3 50 nm above, we suggest that these results indicate the most suitable growing conditions for obtaining high quality sputtered TiO2 thin films with higher transparence performance for solar cell application.

the optical absorbance coefficient for all films were genuinely high esteems coming to above 104 cm-1, which implies that there is allowed direct transitions, the energy gab reach to the typical value of the bulk TiO2 (3.5) eV